Since 1978, C.C. Steven & Associates has been the leading expert in the static control and static mitigation industry. We solve problems and provide solutions! With our extensive experience, we’ve offered a variety of solutions for different applications, many of which involve ionizing blow-off or ionizing nozzles to remove particulate debris from your processes.
A common question has been: where do the particles go? We now have the answer with our innovative Particle Capture System family of products. Our six standard configurations include the under-bench, tabletop version, vertical, clean cube, clean table, and dual duct systems. These solutions are designed to meet the challenges of source capturing in your manufacturing process. Additionally, we offer custom configurations to tailor our systems specifically to your application needs.
Feel free to visit our website to watch our videos, explore our products, and send any questions our way. You are also welcome to visit us at our location, where you can bring your parts in trays, and we’ll clean them on-site, helping you determine which PCS Clean family product best suits your needs.
Thank you for your time. We look forward to hearing from you. Have a great day! www.ccsteven.com
Introducing the Particle Capture System (PCS): Muon Trap® (US Patent #10,610,817 and CE APPROVED) product line. We will not only blow off particulate from your product, we will capture what is blown off as well. Our first release in this new product line is the Under Bench Mount PCS Muon Trap® (US Patented/CE Approved) AND the Clean Station PCS Trap® version ALL with closed loop particle capture with Hepa Filter return. We also offer a Dual PCS Muon Trap® with dual intake inlets, and a Vertical PCS Muon Trap®. We have a PCS Platform Assembly with castors available for the Under Bench Mount, Dual and Vertical configurations. The PCS Muon Trap® offerings can be provided with or without ionization.
Our US Patented system design has up to 4 times more face velocity at the capture hood than any other system on the market. The face velocity is the key to capturing particulate. Don’t be fooled by other particle traps or capture systems that claim to work! Without proper face velocity your particles are not being captured, and what is the point of a capturing system if it isn’t trapping the particulate?
Call us today for on-site demo or our Trial Demo Program.
Particle contamination due to static attraction is a leading cause of significant yield losses in medical device manufacturing. This challenge impacts a broad spectrum of
Eliminating static fields to mitigate electrostatic attraction (ESA) in medical device manufacturing is crucial for maintaining the quality and functionality of the devices. One effective
Since 1978, C.C. Steven & Associates has been the leading expert in the static control and static mitigation industry. We solve problems and provide solutions!
A name you can trust. Doing business since 1978!
